JPH0252433U - - Google Patents
Info
- Publication number
- JPH0252433U JPH0252433U JP13274088U JP13274088U JPH0252433U JP H0252433 U JPH0252433 U JP H0252433U JP 13274088 U JP13274088 U JP 13274088U JP 13274088 U JP13274088 U JP 13274088U JP H0252433 U JPH0252433 U JP H0252433U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- spraying
- semiconductor device
- main body
- inert gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011261 inert gas Substances 0.000 claims 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13274088U JPH0252433U (en]) | 1988-10-11 | 1988-10-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13274088U JPH0252433U (en]) | 1988-10-11 | 1988-10-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0252433U true JPH0252433U (en]) | 1990-04-16 |
Family
ID=31389982
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13274088U Pending JPH0252433U (en]) | 1988-10-11 | 1988-10-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0252433U (en]) |
-
1988
- 1988-10-11 JP JP13274088U patent/JPH0252433U/ja active Pending